optical proximity correction meaning in Chinese

光学距离校正

An efficient approach to rules - based optical proximity correction
一种新的光学临近校正方法
Opc optical proximity correction
光学临近修正
Optical proximity correction ( opc ) is emerging as an important tool in design and manufacturing of next generation integrated circuits
光学邻近效应校正( opc )是下一代集成电路设计和生产的重要工具。
Before more advanced lithography tool is produced , in order to use current tools to manufacture vdsm ic , reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry
在波长更小的光刻系统出现前，为了能利用现有设备解决集成电路的可制造性问题，工业界提出了对掩模作预失真(光学邻近校正)和在掩模上加相位转移模(移相掩模)等的掩模校正方法。
For the coordination of the contradictory , the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask . it includes : pupil filtering , phase shift mask , off - axis illumination , optical proximity correction , and so on
为了协调这种矛盾，利用波前工程来改善光刻图形的质量以提高光刻分辨率，已广泛地应用于光学光刻中，如：瞳孔滤波、相移掩模、离轴照明、光学邻近效应校正等。